Polishing pad manufacturing method

This invention describes a way to make polishing pads that have a clear window for looking through while polishing. The process involves carving a groove into the back of a polishing layer, filling that groove with a clear material, and then buffing the front surface until the clear part is exposed. The claims specify that, after buffing, this clear window should be between 20% and 90% of the polishing layer's total thickness.

Why it matters: Filed before significant advancements in optical metrology and automated inspection systems. These technologies now make real-time, high-accuracy monitoring through polishing pads more feasible and valuable for precision manufacturing.

Status: Not in forceListed as no longer active. The specific reason is not in the record we hold.
How hard to build: ModerateCustom molds, specific resins, buffing equipment

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