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Patent drawing for Methods for electrochemically fabricating structures using adhered masks, incorporating dielectric sheets, and/or seed layers that are partially removed via planarization
US 7,501,328 B2
Chemistry US 7,501,328 B2 Not in force

Methods for electrochemically fabricating structures using adhered masks, incorporating dielectric sheets, and/or seed layers that are partially removed via planarization

This describes a method for building tiny, intricate 3D objects by stacking many thin layers. It uses electroplating to deposit material, often incorporating insulating sheets, and then shapes each layer using masks. The masks can be transferred onto the surface or printed directly, for example, with an inkjet. The process specifically requires that at least one of the materials used in the structure is an insulating (dielectric) material.

Why it matters: Filed before the widespread advancement of high-resolution, multi-material additive manufacturing and micro-dispensing technologies. The precision and material versatility of computer-controlled inkjet and extrusion for mask patterning at the microscale have significantly improved since 2005.

Status
Not in forceListed as no longer active. The specific reason is not in the record we hold.
How hard to build
SpecializedMicrofabrication, electroplating, precise masking, inkjet deposition.

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