Cluster processing system for forming a metal containing material

This invention describes a method for creating tiny components for semiconductor devices. It involves forming an extremely thin layer of a specific material, such as MoS2 or WS2, on a base, then heating that layer, and finally adding a protective top layer. All these steps are performed sequentially within a specialized processing system without ever exposing the material to air.

Why it matters: Continued advancements in atomic layer deposition and chemical vapor deposition for 2D materials, alongside improved in-situ process control within vacuum cluster systems, may now offer better prospects for achieving the required material quality and uniformity for semiconductor integration.

Status: Not in forceListed as no longer active. The specific reason is not in the record we hold.
How hard to build: SpecializedSpecialized vacuum cluster processing equipment

3 AI reinvention directions for this patent

See all three

AI gives you a few directions you could take this. Pick one, and we check whether your version is different enough to patent, then write the filing.

Reinvent this with AI

Where this one came from

Every morning we go through millions of abandoned patents and pick out 15 worth your time. This was one of today’s.

This one

+10