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Patent drawing for Gray-tone resists and processes
US 20,230,130,753 A1
Lithography US 20,230,130,753 A1 Not in force

Gray-tone resists and processes

This invention describes a method for creating tiny, precise patterns with varying depths on a surface. It uses a special light-sensitive material that, after being exposed through a gray-scale mask and developed, forms a pattern with non-uniform thickness. This patterned material is then baked to make it much harder and more stable, preventing it from deforming during subsequent manufacturing steps. The claims specify applying this material over an existing pattern on a substrate.

Why it matters: Since 2022, the drive for higher precision and yield in fabricating complex 3D micro-optical components and diffraction gratings for advanced applications has intensified. This method's ability to prevent etching defects by stabilizing the resist becomes more critical for meeting those tighter specifications.

Status
Not in forceListed as no longer active. The specific reason is not in the record we hold.
How hard to build
SpecializedSpecialized chemicals, lithography equipment, cleanroom facilities.

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